Skip to content

Crystal Deposition

Wafer- and pattern-level GDS/STL for depositing/growing the anthracene crystal, plus the Nanoscribe process-calibration pattern used alongside it:

  • Hex dot wafer boy v1 — 10x10 grid of 10mm chips on a 4-inch wafer, hexagonal dot lattice, with several center-cluster variants (2x2 through 5x5, with/without a "boy" text chip).
  • Nanoscribe cone grid v1 — 8x8mm hexagonal grid of 5um cones for Nanoscribe printing.
  • Nanoscribe calibration grid v1 — a Nanoscribe process-calibration pattern (write-parameter calibration, not stage positioning — see Nanopositioning Probes for the stage-calibration dot grid).